Sputtering with gas cluster-ion beams

被引：9

作者：

Matsuo, J ^{[1
]}

Akizuki, M ^{[1
]}

Northby, J ^{[1
]}

Takaoka, GH ^{[1
]}

Yamada, I ^{[1
]}

机构：

[1] SANYO ELECT CORP,MICROELECT RES CTR,GIFU 50301,JAPAN

来源：

SURFACE REVIEW AND LETTERS | 1996年 / 3卷 / 01期

关键词：

D O I：

10.1142/S0218625X96001820

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A high-current (similar to 100 nA) cluster-ion-beam equipment with a new mass filter has been developed to study the energetic cluster-bombardment effects on solid surfaces. A dramatic reduction of Cu concentration on silicon surfaces has been achieved by 20-keV Ar cluster (N similar to 3000) ion bombardment. The removal rate of Cu with cluster ions is two orders of magnitude higher than that with monomer ions. A significantly higher sputtering yield is expected for cluster-ion irradiation. An energetic cluster-ion beam is quite suitable for removal of metal.

引用

页码：1017 / 1021

页数：5

共 14 条

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