A 0.15-μm 60-GHz high-power composite channel GaInAs/ZnP HEMT with low gate current

被引:8
作者
Boudrissa, M [1 ]
Delos, E [1 ]
Wallaert, X [1 ]
Théron, D [1 ]
De Jaeger, JC [1 ]
机构
[1] Univ Sci & Technol Lille, Dept Hyperfrequence & Semicond, UMR CNRS 8520, IEMN, F-59652 Villeneuve Dascq, France
关键词
breakdown; impact-ionization; InP; microwave power HEMTs;
D O I
10.1109/55.924834
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This letter presents recent improvements and experimental results provided by a GaInAs/InP composite channel high electron mobility transistors (HEMT), The devices exhibit good dc and rf performances. The 0.15-mum gate length devices have saturation current density of 750 mA/mm at V-GS = +0 V The Schottky characteristic is a typical reverse gate-to-drain breakdown voltage of -8 V. Gate current issued from impact ionization have been studied in these devices, in the first time, versus drain extension, At 60 GHz, an output power of 385 mW/mm have been obtained in such a device with a 5.3 dB linear gain and 41% drain efficiency which constitutes the state-of-the-art. These results studied are the first reported for a composite channel Al(0.65)In(0.35)AS/Ga(0.47)In(0.35)AS/lnP HEMT on InP substrate.
引用
收藏
页码:257 / 259
页数:3
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