Electronic properties of passivating compounds: application to the fluorine evolution reaction

被引:12
作者
Groult, H [1 ]
Devilliers, D
Durand-Vidal, S
Nicolas, F
Combel, M
机构
[1] Univ Paris 06, Lab L12C Electrolytes & Electrochim, CNRS UMR 7612, F-75252 Paris 05, France
[2] Comurhex Cogema, F-26701 Pierrelatte, France
关键词
fluorine; tantalum oxide; mercury; electronic conductivity; HOPG;
D O I
10.1016/S0013-4686(98)00396-X
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The electronic properties of carbon-fluorine films (denoted C-F) formed on carbon electrodes in KF-2HF during fluorine evolution reaction were investigated. Impedance spectra obtained with C/C-F/Hg, C/PbO2/Hg and Ta/Ta2O5/Hg structures were compared. The latter exhibits a capacitive loop whereas the former does not. However, if a breakdown of the Ta2O5 oxide occurred, the capacitive loop is not observed, as in the case of C/PbO2/Hg structures which are characterised by the electronic conductivity of PbO2. The passivating C-F films formed on carbon anodes in KF-2HF behave as electronic conductors. This result was confirmed by studying the kinetics of the electron transfer of the Fe-III/II redox couple in aqueous solution, using a C/C-F electrode. These electrodes behave like metallic platinum electrodes. The influence of the amount of insulating graphite fluorides on the surface of the electrodes was demonstrated. Thus, the high anodic overvoltage observed during fluorine evolution on C/C-F anodes in KF-2HF is mainly attributed to the poor wettability of the electrodes by the milt, which results in a small electroactive area. STM measurements have shown composition heterogeneities at the surface of fluorinated HOPG. Moreover, hexagonal symmetry was pointed out; the electron density map is interpreted on the basis of bonding of HF2- species to carbon atoms. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2793 / 2803
页数:11
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