Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition

被引:352
作者
Matsui, S
Kaito, T
Fujita, J
Komuro, M
Kanda, K
Haruyama, Y
机构
[1] Himeji Inst Technol, Ako, Hyogo, Japan
[2] Seiko Instrument Inc, Shizuoka, Japan
[3] NEC, Fundamental Res Labs, Tsukuba, Ibaraki, Japan
[4] MITI, Electrotech Lab, Tsukuba, Ibaraki 305, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 06期
关键词
D O I
10.1116/1.1319689
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Three-dimensional nanostructure fabrication has been demonstrated by 30 keV Ga+ focused ion beam assisted deposition using a aromatic hydrocarbon precursor. The characterization of deposited film on a silicon substrate was pet-formed by a transmission microscope and Raman spectra. This result indicates that the deposition film is a diamondlike amorphous carbon. Production of three-dimensional nanostructure is discussed. Microcoil, drill, and bellows with 0.1 mum dimension were fabricated as parts of the microsystem. Furthermore, microstructure plastic arts is advocated as a new field using microbeam technology, presenting one example of a microwine glass with 2.75 mum external diameter and 12 mum height. (C) 2000 American Vacuum Society. [S0734-211X(00)06806-2].
引用
收藏
页码:3181 / 3184
页数:4
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