Conductance peak splitting in hole transport through a SiGe double quantum dot

被引:24
作者
Cain, PA
Ahmed, H
Williams, DA
机构
[1] Univ Cambridge, Cavendish Lab, Microelect Res Ctr, Cambridge CB3 0HE, England
[2] Univ Cambridge, Cavendish Lab, Hitachi Europe Ltd, Hitachi Cambridge Lab, Cambridge CB3 0HE, England
关键词
D O I
10.1063/1.1377320
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have observed the splitting of Coulomb oscillation peaks in coupled Si0.9Ge0.1 double quantum dots at 4.2 K. The quantum dots are formed by trench isolation, which means that the dots can be made much smaller than possible with the surface-gated approach. A dot diameter of 50 nm or less increases the charging energy and, therefore, the operating temperature of the device compared to previous approaches. A simulation of the results using parameters calculated from the lithographic dimensions of the device shows that a good fit to the experimental data can be achieved with a realistic interdot capacitance value. (C) 2001 American Institute of Physics.
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页码:3624 / 3626
页数:3
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