Particle emission debris from a KrF laser-plasma x-ray source

被引:28
作者
Bobkowski, R
Fedosejevs, R
机构
[1] Department of Electrical Engineering, University of Alberta, Edmonton
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 04期
关键词
D O I
10.1116/1.580070
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The production of plasma debris ejected from various solid targets heated and ionized by intense KrF laser pulses was studied. The plasma is produced by focusing a train of 50 ps KrF laser pulses to an 8-mu m-diam spot on the surface of solid tape targets. The plasma conditions are those of interest for the generation of a point source of the keV and sub-keV x rays for microlithography (Cu and Fe targets) and x-ray microscopy (plastic targets). Experimental measurements of the amounts of debris produced, the statistical distribution of the debris size, and angular distribution in vacuum are presented. The results of similar measurements in a background gas of helium are also presented together with measurements of the stopping power of the gas. A large flux of micron and submicron size particles is generated in vacuum even when employing thin tape targets. The introduction of a background gas reduces the damaging influence of such particles dramatically but only if enough path length exists to stop the particles. Theoretical calculations have been carried out of the stopping power of the background gas based on Stokes law and the Newtonian theory of deceleration of particles in gas. (C) 1996 American Vacuum Society.
引用
收藏
页码:1973 / 1980
页数:8
相关论文
共 25 条
[1]  
*ALEX VAC RES INC, B10 FILT MAT
[2]  
BIJERK F, 1992, P SOC PHOTO-OPT INS, V1848, P516
[3]   GROWTH OF THIN-FILMS BY LASER-INDUCED EVAPORATION [J].
CHEUNG, JT ;
SANKUR, H .
CRC CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES, 1988, 15 (01) :63-109
[4]   VELOCITY DISTRIBUTION OF MICRON-SIZE PARTICLES IN THIN-FILM LASER ABLATION DEPOSITION (LAD) OF METALS AND OXIDE SUPERCONDUCTORS [J].
DUPENDANT, H ;
GAVIGAN, JP ;
GIVORD, D ;
LIENARD, A ;
REBOUILLAT, JP ;
SOUCHE, Y .
APPLIED SURFACE SCIENCE, 1989, 43 :369-376
[5]  
FEDOSEJEVS R, 1992, SPIE, V1671, P373
[6]   DYNAMICS OF EXCIMER LASER-ABLATED ALUMINUM NEUTRAL ATOM PLUME MEASURED BY DYE-LASER RESONANCE-ABSORPTION PHOTOGRAPHY [J].
GILGENBACH, RM ;
VENTZEK, PLG .
APPLIED PHYSICS LETTERS, 1991, 58 (15) :1597-1599
[7]   DEBRIS AND VUV EMISSION FROM A LASER-PRODUCED PLASMA OPERATED AT 150 HZ USING A KRYPTON FLUORIDE LASER [J].
GINTER, ML ;
MCILRATH, TJ .
APPLIED OPTICS, 1988, 27 (05) :885-889
[8]  
Hinds W.C., 1982, Aerosol Technology
[9]   SOFT-X-RAY MICROSCOPES [J].
KIRZ, J ;
RARBACK, H .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1985, 56 (01) :1-13
[10]   LASER WAVELENGTH DEPENDENT PROPERTIES OF YBA2CU3O7-DELTA THIN-FILMS DEPOSITED BY LASER ABLATION [J].
KOREN, G ;
GUPTA, A ;
BASEMAN, RJ ;
LUTWYCHE, MI ;
LAIBOWITZ, RB .
APPLIED PHYSICS LETTERS, 1989, 55 (23) :2450-2452