Design of LIGA beamline using a multilayer-coated reflection mirror

被引：4

作者：

Kinoshita, H ^{[1
]}

Kimpara, Y ^{[1
]}

Uruga, T ^{[1
]}

Watanabe, T ^{[1
]}

Niibe, M ^{[1
]}

Platonov, Y ^{[1
]}

Wood, JL ^{[1
]}

机构：

[1] Himeji Inst Technol, Lab Adv Sci & Technol Ind, Himeji, Hyogo 6712201, Japan

来源：

ADVANCES IN MIRROR TECHNOLOGY FOR SYNCHROTRON X-RAY AND LASER APPLICATIONS | 1998年 / 3447卷

关键词：

synchrotron; LIGA; micromachining; multilayer;

D O I：

10.1117/12.331117

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

This paper describes the beamline optics for deep-etch X-ray lithography (LIGA). In order to obtain a higher reflectivity than that provided by a mirror with a monolayer coating at photon energies of 4 to 6 keV, multilayer mirrors with a constant and graded d-spacing were developed. At an energy of 6 keV, a measured reflectivity of more than 80% and a band width of 1 keV were obtained for a mirror with a Ni/C multilayer coating and a constant d-spacing. Moreover, it was found that, for energies from 4 to 6 keV, a multilayer mirror with a graded d-spacing provided a higher reflectivity and a wider bandwidth than a mirror with a Pt monolayer coating. A multilayer reflection mirror is a promising component of beamline optics for use in microfabrication and the structural analysis of materials.

引用

页码：2 / 11

页数：10