Surface morphology and electronic state characterization of Ni-P amorphous alloy films

被引：29

作者：

Li, HX ^{[1
]}

Wang, WJ

Chen, HY

Deng, JF

机构：

[1] Shanghai Normal Univ, Dept Chem, Shanghai 200234, Peoples R China

[2] Fudan Univ, Dept Chem, Shanghai 200433, Peoples R China

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 2001年 / 281卷 / 1-3期

基金：

中国国家自然科学基金;

关键词：

D O I：

10.1016/S0022-3093(00)00430-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of Ni-P amorphous alloy were deposited by electroless plating onto a p-type silicon substrate. The films underwent a cyclic oxidation-reduction or a crystallization treatments, respectively. The amorphous structure and its crystallization were studied by X-ray diffraction (XRD), differential scanning calorimetry (DSC), extended X-ray absorption fine structure (EXAFS), scanning electron microscopy (SEM), atomic force microscopy (AFM), scanning tunneling microscopy (STM). The change in the surface composition and surface electronic state were investigated by X-ray photoelectron spectroscopy (XPS). (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：31 / 38

页数：8

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