Characterisations of atmospheric pressure ejected plasma sources

被引：18

作者：

Kim, YH ^{[1
]}

Choi, YH ^{[1
]}

Kim, JH ^{[1
]}

Park, JK ^{[1
]}

Ju, WT ^{[1
]}

Paek, KH ^{[1
]}

Hwang, YS ^{[1
]}

机构：

[1] Seoul Natl Univ, Nucl Plasma Expt Lab, Dept Nucl Engn, Seoul, South Korea

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 174卷

关键词：

atmospheric pressure ejected plasma; OES; gas temperature; radical density;

D O I：

10.1016/S0257-8972(03)00412-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Atmospheric pressure ejected plasma sources have been developed for processing arbitrary shaped objects. Plasma sources with two coaxial electrodes are characterised experimentally by varying source design parameters such as discharge volume and discharge gap distance under various operating conditions such as RF power, gas flow rate, and gas compositions. Using optical emission spectroscopy (OES), gas temperatures and radical densities are qualitatively evaluated for flexible applications of the source. Discharge characteristics as glow has been confirmed with voltage and current (V-I) probes. Based on these source characteristics, specific design rules are presented for various applications such as polymer surface modification and metal surface decontamination. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：535 / 540

页数：6

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