Polarization of out-of-plane optical scatter from SiO2 films grown on photolithographically-generated microrough silicon

被引：2

作者：

Germer, TA ^{[1
]}

Scheer, BW ^{[1
]}

机构：

[1] NIST, Opt Technol Div, Gaithersburg, MD 20899 USA

来源：

SCATTERING AND SURFACE ROUGHNESS II | 1998年 / 3426卷

关键词：

bidirectional ellipsometry; dielectric films; microroughness; polarimetry; scatter; surfaces;

D O I：

10.1117/12.328451

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Bidirectional ellipsometry results are presented for scatter from SiO2 films grown on photolithographically produced microrough silicon surfaces. The principle direction of the polarization and the degree of linear polarization for scatter directions out of the plane of incidence are compared to results of theoretical modeling for interfacial microroughness in the presence of dielectric layers. The results indicate that light scattered from these surfaces does not behave like that from two truly random rough correlated interfaces. Possible reasons for the lack of agreement between the model and the data are discussed.

引用

页码：160 / 168

页数：9