Selective oxidation of o-xylene to phthalic anhydride on V2O5 supported on TiO2-coated SiO2

被引：30

作者：

Dias, CR ^{[1
]}

Portela, MF ^{[1
]}

GalanFereres, M ^{[1
]}

Banares, MA ^{[1
]}

Granados, ML ^{[1
]}

Pena, MA ^{[1
]}

Fierro, JLG ^{[1
]}

机构：

[1] UNIV AUTONOMA MADRID,CSIC,INST CATALISIS & PETROLEOQUIM,E-28049 MADRID,SPAIN

来源：

CATALYSIS LETTERS | 1997年 / 43卷 / 1-2期

关键词：

vanadia-titania-silica ternary catalysts; o-xylene oxidation; phthalic anhydride production; catalyst characterization;

D O I：

10.1023/A:1018990506391

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A ternary V-Ti-Si catalyst was prepared by depositing the vanadium oxide precursor on a SiO2 previously coated by TiO2. The ternary V-Ti-Si catalyst and the corresponding binary V-Ti and V-Si counterparts were tested for the selective oxidation of o-xylene to phthalic anhydride. Silica-supported vanadium oxide shows lowest activity and selectivity, meanwhile selectivity to phthalic anhydride is higher on titania-containing catalysts. The best yield to phthalic anhydride (82.5%) is obtained at 573 K on the ternary V-Ti-Si catalyst which is comparable to that claimed for the best conventional V-Ti catalysts described in literature.

引用

页码：117 / 121

页数：5

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