Magnetostrictive thin films prepared by RF sputtering

被引:6
作者
Carabias, I [1 ]
Martinez, A [1 ]
Garcia, MA [1 ]
Pina, E [1 ]
Gonzalez, JM [1 ]
Hernando, A [1 ]
Crespo, P [1 ]
机构
[1] UCM, RENFE, Inst Magnet Aplicado, Madrid 28230, Spain
关键词
magnetostriction; amorphous systems-films; thin film; substrates properties;
D O I
10.1016/j.jmmm.2004.11.373
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Fe80B20 thin films have been prepared by ion beam sputtering magnetron on room temperature. The films were fabricated on different substrates to compare the different magnetic and structural properties. In particular the growth of films on flexible substrates (PDMS, Kapton) has been studied to allow a simple integration of the system in miniaturized magnetostrictive devices. X-ray diffraction patterns indicate that films are mainly amorphous although the presence of some Fe nanoparticles cannot be ruled out. The coercive field of thin films ranges between 15 and 35 Oe, depending on substrate. Magnetostriction measurements indicate the strong dependence of the saturation magnetostriction with the substrate. Samples on flexible substrates exhibit a better performance than samples deposited onto glass substrates. © 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:823 / 825
页数:3
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