Giant magnetoresistance in multilayers electrodeposited on n-Si

Co-Ni-Cu/Cu multilayers have been electrodeposited directly onto n-type Si substrates. This removes the need to use a seed-layer deposited by some other method as part of the growth process and makes electrodeposition a significantly more convenient method for fabricating films that exhibit giant magnetoresistance (GMR). A maximum GMR of over 10% and a sensitivity of over 0.04%/Oe were recorded. The GMR and sensitivity of the multilayers both increase with increasing Cu layer thickness. (C) 1998 American Institute of Physics.