Dynamics of photorefractive grating erasure in polymeric composites

被引：36

作者：

Cui, YP ^{[1
]}

Swedek, B ^{[1
]}

Cheng, N ^{[1
]}

Zieba, J ^{[1
]}

Prasad, PN ^{[1
]}

机构：

[1] SUNY Buffalo, Dept Chem, Photon Res Lab, Buffalo, NY 14260 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 01期

关键词：

D O I：

10.1063/1.369395

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Theoretical and experimental studies are presented of the dynamics of photorefractive grating erasure in polymeric photorefractive materials with hole traps. A bi-exponential decay for the rate of optical erasing of the space-charge field has been obtained by theoretical solution. The optically induced erasure rate for polymeric photorefractive materials is theoretically predicted to depend on optical intensity as a sublinear relation of I-alpha, in which alpha is dependent on the electric field. The characteristics of the traps in a photorefractive material play a key role in the dynamics of grating erasure. Experimentally studied was the dynamic process of erasing the photorefractive grating in a polymeric composite, poly-N-vinylcarbazole: fullerene: diethyl aminonitrostyrene:tricresyl phosphate. The theoretical analysis and experimental results reveal that shallow traps are dominant in this photorefractive material. (C) 1999 American Institute of Physics. [S0021-8979(99)02701-2].

引用

页码：38 / 43

页数：6

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