Mechanism and modeling of ring pattern formation for electron beam exposure on Zwitterresist

被引：9

作者：

Chen, JK

Ko, FH

Chen, HL

Chang, FC

机构：

[1] Natl Nano Device Labs, Hsinchu 30050, Taiwan

[2] Natl Chiao Tung Univ, Dept Appl Chem, Hsinchu, Taiwan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2003年 / 42卷 / 6B期

关键词：

zwitterresist; electron beam; heating effect; ring pattern; throughput;

D O I：

10.1143/JJAP.42.3838

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ring width and electron beam dose was linear in two ranges, irrespective of the dot design radius. The heating effect was identified from 600 muC/cm(2), while it could be neglected at less than 600 muC/cm(2). Mathematical modeling for the prediction of ring width for zwitterresist, was achieved by considering the electron scattering and heating effects. The results of experimental measurement and modeling on ring width showed a very good correlation.

引用

页码：3838 / 3841

页数：4