Holographic characterization of epoxy resins at 351.1 nm

被引：4

作者：

Farsari, M ^{[1
]}

Huang, SP ^{[1
]}

Young, RCD ^{[1
]}

Heywood, MI ^{[1
]}

Morrell, PJB ^{[1
]}

Chatwin, CR ^{[1
]}

机构：

[1] Univ Sussex, Sch Engn, Laser & Photon Syst Res Grp, Brighton BN1 9QT, E Sussex, England

来源：

OPTICAL ENGINEERING | 1998年 / 37卷 / 10期

关键词：

microstereolithography; four-wave mixing; photopolymers; ultraviolet curing; rapid prototyping; rapid tooling;

D O I：

10.1117/1.601815

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The optical characteristics of two commercially available UV curable epoxy resins are investigated using nondegenerate four-wave mixing. The materials assessed are optimized for use with a UV argon-ion laser. The holographic gratings were written at a wavelength of lambda = 351.1 nm for an irradiance range 0.5 to 3.0 W/cm(2) and read at lambda = 632.8 nm to compare the reactivity, curing speed, shrinkage, and resolution of the resins. These experiments were carried out to prove the suitability of the photopolymerization systems for microstereolithography. (C) 1998 Society of Photo-Optical Instrumentation Engineers. [S0091-3286(98)02110-2].

引用

页码：2754 / 2759

页数：6

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