The effect of silicon sources on the mechanism of phosphorus-silicon synergism of flame retardation of epoxy resins

被引:109
作者
Liu, YL [1 ]
Chou, CI [1 ]
机构
[1] Chung Yuan Christian Univ, Dept Chem Engn, Chungli 32023, Taiwan
关键词
silicon; flame retardation; synergism; thermal analysis;
D O I
10.1016/j.polymdegradstab.2005.04.004
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The effect of silicon source on the mechanism and efficiency of silicon-phosphorus synergism of flame retardation was studied. The studied systems composed of a phosphorus-containing epoxy resin and various types of silicon additives including nanoscale colloidal silica (CS), tetraethoxysilane (TEOS), and diglycidylether terminated polydimethylsiloxane (PDMS-DG). Thermal stability and degradation kinetics of cured epoxy resins, elemental analysis of degraded residues, and evolved gases analysis of degradation reactions were conducted with a thermogravimetric analyser, energy-dispersive X-ray spectrometry, and gas chromatography-mass spectrometry, respectively. Addition of silicon compounds showed significant effect on enhancing the thermal stability and char yields of the cured epoxy resins. During thermal degradation, TEOS and PDMS-DG exhibited silicon migration to sample surface and CS did not. Self-degradation of PDMS-DG resulted in a silicon loss for PDMS-DG-containing epoxy resin. From the results it was concluded that using TEOS as an additive for epoxy resins and formation of epoxy-silica hybrid structure through sol-gel reactions was a good approach for achieving phosphorus-silicon synergism in flame retardation. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:515 / 522
页数:8
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