Concentration dependence of self-assembled monolayer island nucleation and growth

被引:43
作者
Doudevski, I [1 ]
Schwartz, DK [1 ]
机构
[1] Tulane Univ, Dept Chem, New Orleans, LA 70118 USA
关键词
D O I
10.1021/ja0042783
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We have observed the formation process of octadecylphosphonic acid self-assembled monolayers on mica in situ, at the liquid/solid interface, using atomic force microscopy. The submonolayer island nucleation rate was found to depend on the concentration of the deposition solution, which affects the deposition rate of adsorbate molecules on the substrate. The power-law dependence of the submonolayer island density on the solution concentration was consistent with the interpretation that the minimum size of a stable island is two molecules. Four distinct regimes of growth were found: a low-coverage nucleation regime, an intermediate coverage regime, an aggregation regime in which the island density remained constant, and a coalescence regime. The island density kinetics in the first two regimes were compared with the predictions of a kinetic theory of 2D cluster growth typically used to describe vapor phase molecular beam epitaxy at low temperatures.
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收藏
页码:6867 / 6872
页数:6
相关论文
共 43 条
[1]   DYNAMIC SCALING OF THE ISLAND-SIZE DISTRIBUTION AND PERCOLATION IN A MODEL OF SUBMONOLAYER MOLECULAR-BEAM EPITAXY [J].
AMAR, JG ;
FAMILY, F ;
LAM, PM .
PHYSICAL REVIEW B, 1994, 50 (12) :8781-8797
[2]   Kinetics of submonolayer and multilayer epitaxial growth [J].
Amar, JG ;
Family, F .
THIN SOLID FILMS, 1996, 272 (02) :208-222
[3]   CRITICAL CLUSTER-SIZE - ISLAND MORPHOLOGY AND SIZE DISTRIBUTION IN SUBMONOLAYER EPITAXIAL-GROWTH [J].
AMAR, JG ;
FAMILY, F .
PHYSICAL REVIEW LETTERS, 1995, 74 (11) :2066-2069
[4]  
[Anonymous], CURRENT TOPICS MAT A
[5]   Relationship between friction and molecular structure: Alkylsilane lubricant films under pressure [J].
Barrena, E ;
Kopta, S ;
Ogletree, DF ;
Charych, DH ;
Salmeron, M .
PHYSICAL REVIEW LETTERS, 1999, 82 (14) :2880-2883
[6]   SCALING ANALYSIS OF DIFFUSION-MEDIATED ISLAND GROWTH IN SURFACE-ADSORPTION PROCESSES [J].
BARTELT, MC ;
EVANS, JW .
PHYSICAL REVIEW B, 1992, 46 (19) :12675-12687
[7]   GROWTH OF SELF-ASSEMBLED N-ALKYLTRICHLOROSILANE FILMS ON SI(100) INVESTIGATED BY ATOMIC-FORCE MICROSCOPY [J].
BIERBAUM, K ;
GRUNZE, M ;
BASKI, AA ;
CHI, LF ;
SCHREPP, W ;
FUCHS, H .
LANGMUIR, 1995, 11 (06) :2143-2150
[8]   Substrate effects on the formation of alkylsiloxane monolayers [J].
Brunner, H ;
Vallant, T ;
Mayer, U ;
Hoffmann, H ;
Basnar, B ;
Vallant, M ;
Friedbacher, G .
LANGMUIR, 1999, 15 (06) :1899-1901
[9]   Observation of three growth mechanisms in self-assembled monolayers [J].
Carraro, C ;
Yauw, OW ;
Sung, MM ;
Maboudian, R .
JOURNAL OF PHYSICAL CHEMISTRY B, 1998, 102 (23) :4441-4445
[10]   Mechanisms of self-assembled monolayer desorption determined using in situ atomic force microscopy [J].
Doudevski, I ;
Schwartz, DK .
LANGMUIR, 2000, 16 (24) :9381-9384