Properties of tetrahedral amorphous carbon deposited by a filtered cathodic vacuum arc

被引:4
作者
Chhowalla, M
Chen, CW
Kleinsorge, B
Robertson, J
Amaratunga, GAJ
Milne, WI
机构
来源
III-NITRIDE, SIC AND DIAMOND MATERIALS FOR ELECTRONIC DEVICES | 1996年 / 423卷
关键词
D O I
10.1557/PROC-423-299
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The properties of a highly sp(3) bonded form of amorphous carbon denoted ta-C deposited from a filtered cathodic vacuum are (FCVA) are described as a function of ion energy and deposition temperature. The sp(3) fraction depends strongly on ion energy and reaches 85% at an ion energy of 100 eV. Other properties such as density and band gap vary in a similar fashion, with the optical gap reaching a maximum of 2.3 eV. These films are very smooth with area roughness of order 1 nm. The sp(3) fraction falls suddenly to almost zero for deposition above about 200 degrees C.
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页码:299 / 304
页数:6
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