New highly efficient radical photoinitiators based on si-si bond cleavage

被引:45
作者
Lalevee, J. [1 ]
El-Roz, M. [1 ]
Morlet-Savary, F. [1 ]
Graff, B. [1 ]
Allonas, X. [1 ]
Fouassier, J. P. [1 ]
机构
[1] Univ Haute Alsace, CNRS, Dept Photochem, ENSCMu,UMR 7525, F-68093 Mulhouse, France
关键词
D O I
10.1021/ma071489k
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Two Si-Si bond based photoinitiators that differ by their methyl versus phenyl substituents, were investigated to measure the reactivity of the silyl radicals. The Si-Si based structures, (10,10'-bis-(10-phenyl-10H-phenoxasilin) PI-1 and 9,9' -dimethyl-9,9' -bis-(9H-9-silafluorene) PI-2) were selected and through steady-state experiments, laser flash photolysis and quantum mechanical calculations. The photopolymerization ability of these photoinitiators was evaluated and compared to type I photoinitiator DMPA. Along with this the reactivity of the silyl radicals was also investigated and a mechanism for the initiation step was proposed. Nanosecond laser flash photolysis (LFP) experiments were done using Q-switched nanosecond Nd/YAG laser. As a result it was found that the reactivity of these new photoinitiators was higher than that of DMPA and they have promising potential which can increase further.
引用
收藏
页码:8527 / 8530
页数:4
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