Effects of catalyst film thickness on plasma-enhanced carbon nanotube growth

被引:131
作者
Hofmann, S [1 ]
Cantoro, M
Kleinsorge, B
Casiraghi, C
Parvez, A
Robertson, J
Ducati, C
机构
[1] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[2] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England
关键词
D O I
10.1063/1.1989432
中图分类号
O59 [应用物理学];
学科分类号
摘要
A systematic study is presented of the influence of catalyst film thickness on carbon nanostructures grown by plasma-enhanced chemical-vapor deposition from acetylene and ammonia mixtures. We show that reducing the Fe/Co catalyst film thickness below 3 nm causes a transition from larger diameter (>40 nm), bamboolike carbon nanofibers to small diameter (similar to 5 nm) multiwalled nanotubes with two to five walls. This is accompanied by a more than 50 times faster growth rate and a faster catalyst poisoning. Thin Ni catalyst films only trigger such a growth transition when pretreated with an ammonia plasma. We observe a limited correlation between this growth transition and the coarsening of the catalyst film before deposition. For a growth temperature of <= 550 degrees C, all catalysts showed mainly a tip growth regime and a similar activity on untreated silicon, oxidized silicon, and silicon nitride support. (c) 2005 American Institute of Physics.
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页数:8
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