Molecularly intact and dissociative adsorption of water on clean Cu(110):: A comparison with the water/Ru(001) system

被引：86

作者：

Andersson, K

Gómez, A

Glover, C

Nordlund, D

Öström, H

Schiros, T

Takahashi, O

Ogasawara, H

Pettersson, LGM

Nilsson, A

机构：

[1] Stanford Synchrotron Radiat Lab, Menlo Pk, CA 94025 USA

[2] Stockholm Univ, FYSIKUM, Albanova Univ Ctr, S-10691 Stockholm, Sweden

[3] Australian Natl Univ, Res Sch Phys Sci & Engn, Canberra, ACT 0200, Australia

[4] Hiroshima Univ, Grad Sch Sci, Dept Chem, Higashihiroshima 7398526, Japan

来源：

SURFACE SCIENCE | 2005年 / 585卷 / 03期

关键词：

molecule-solid reactions; synchrotron radiation photoelectron spectroscopy; radiation damage; surface chemical reaction; water; copper; ruthenium; low index single crystal surfaces;

D O I：

10.1016/j.susc.2005.04.024

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An X-ray photoelectron spectroscopy (XPS) study was undertaken of the water/Cu(1 1 0)-system finding non-dissociative adsorption on clean Cu(1 1 0) at temperatures below 150 K. Thermally induced dissociation of D2O is observed to occur above 150 K, similar to the H2O/Ru(0 0 1) system, with an experimentally derived activation barrier of 0.53-0.56 eV which is very close in magnitude to the derived activation barrier for desorption of 0.50-0.53 eV. X-ray and electron induced damage to the water overlayer was quantified and used to rationalize the results of a recent XPS study of the water/Cu(1 1 0)-system where partial dissociation was observed already at 90 K. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：L183 / L189

页数：7

共 28 条

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