Adsorption of nanocolloidal SiO2 particles on PEO brushes

被引:54
作者
Gage, RA
Currie, EPK
Stuart, MAC
机构
[1] Univ Wageningen & Res Ctr, Lab Phys & Colloidal Chem, NL-6703 HB Wageningen, Netherlands
[2] DSM Res BV, NL-6160 MD Geleen, Netherlands
关键词
D O I
10.1021/ma0018695
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
Reflectometry was used to develop a brush-particle system by measuring the adsorption of nanocolloidal SiO2 particles onto brushes prepared by the Langmuir-Blodgett (LB) technique. The adsorption of nanocolloidal SiO2 varied strongly as a function of the pH. The adsorbed amount did not increase indefinitely, but levelled off at a value which depended on the pH value.
引用
收藏
页码:5078 / 5080
页数:3
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