Influence of layer interface parameters on dielectric characteristics of BSTO ferroelectric film planar capacitors

被引:8
作者
Dedyk, AI
Karmanenko, SF
Leppavuori, S [1 ]
Sakharov, VI
Semenov, AA
Serenkov, IT
Ter-Martirosyan, LT
Uusimaki, A
Wang, F
机构
[1] St Petersburg Electrotech Univ, St Petersburg 197376, Russia
[2] Univ Oulu, Microelect Lab, FIN-90570 Oulu, Finland
[3] Univ Oulu, Phys Mat Lab, FIN-90570 Oulu, Finland
[4] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
来源
JOURNAL DE PHYSIQUE IV | 1998年 / 8卷 / P9期
关键词
D O I
10.1051/jp4:1998941
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Ferroelectric BaxSr1-xTiO3 (BSTO) films were prepared on sapphire (r-cut) and MgO substrates using two preparation processes-RF sputtering and the sol-gel method. The structure of the fame and interfaces were investigated by middle energy ion back scattering combined with ion channelling. Planar capacitors patterned on the film allowed the temperature dependence of capacitance and voltage-capacitance characteristics (VCC) to be measured at a frequency of 1 MHz The influence of some interface parameters (e.g. the presence of intermediate layers, structural ordering of the BSTO surface layer, the type of film electrode) on dielectric characteristics, VCC hysteresis and tunability of the planar capacitors are discussed.
引用
收藏
页码:217 / 220
页数:4
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