High damage threshold fluoride UV mirrors made by Ion beans sputtering

被引：19

作者：

Dijon, J ^{[1
]}

Quesnel, E ^{[1
]}

Rolland, B ^{[1
]}

Garrec, P ^{[1
]}

Pelle, C ^{[1
]}

Hue, J ^{[1
]}

机构：

[1] CEA Grenoble, LETI, DOPT, Couches Minces Opt, F-38054 Grenoble 9, France

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1997, PROCEEDINGS | 1998年 / 3244卷

关键词：

Laser induced damage; ultraviolet; UV coating; fluoride materials; Ion Beam Sputtering;

D O I：

10.1117/12.306989

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The demonstration of the technical feasibility of very high damage threshold mirrors deposited by an Ion Beam Sputtering process is made. The two chosen materials are Yttrium fluoride (YF3) for the high index and Lithium fluoride (LiF) for the low index. The threshold of these two materials at 355nm 3ns is higher than 20J/cm(2). High reflection stacks have been deposited with a reflection level of 98.5% and 52 threshold which meets the Laser megajoule (LMJ) requirements.

引用

页码：406 / 416

页数：11