Imaging of sub-surface nano particles by tapping-mode atomic force microscopy

被引:22
作者
Feng, JY
Weng, LT
Chan, CM
Xhie, J
Li, L
机构
[1] Hong Kong Univ Sci & Technol, Adv Engn Mat Facil, Dept Chem Engn, Kowloon, Hong Kong, Peoples R China
[2] Hong Kong Univ Sci & Technol, Mat Characterizat & Preparat Facil, Kowloon, Hong Kong, Peoples R China
关键词
XPS; SIMS; TN-AFM;
D O I
10.1016/S0032-3861(00)00464-X
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 [高分子化学与物理]; 080501 [材料物理与化学]; 081704 [应用化学];
摘要
Time-of-Right secondary ion mass spectrometry (ToF-SIMS), X-ray photoelectron spectroscopy (XPS), and tapping mode atomic force microscopy (TM-AFM) were used to study the surface of a poly(N-vinyl-2-pyrrolidone) thin film containing nano silica particles. ToF-SIMS results illustrate that the topmost layer of the thin film consists of PVP and a small amount of poly(dimethyl siloxane) (PDMS). Nano silica particles are localized underneath this layer. XPS results suggest that the concentration of the silica particles increases as the sampling depth increases from 5.3 to 7.2 nm. TM-AFM phase imaging is shown to be capable of detecting the presence of these sub-surface nano silica particles. (C) 2000 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:2259 / 2262
页数:4
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