The chemical bonding state of nitrogen in kapton-derived carbon film and its effect on the graphitization process

被引:51
作者
Inagaki, M [1 ]
Tachikawa, H
Nakahashi, T
Konno, H
Hishiyama, Y
机构
[1] Hokkaido Univ, Grad Sch Engn, Kita Ku, Sapporo, Hokkaido 060, Japan
[2] Musashi Inst Technol, Setagaya Ku, Tokyo 158, Japan
关键词
graphitization; photoelectron spectroscope; X-ray diffraction; crystal structure; galvanomagnetic properties;
D O I
10.1016/S0008-6223(97)00236-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The chemical bonding state of the nitrogen which remains in the carbon films derived from a polyimide Kapton film was studied by X-ray photoelectron spectroscope and related to the changes in structure and transport properties. The nitrogen remaining after heal treatment up to 2200 degrees C was in a tertiary bonding state, replacing carbon atoms in hexagonal layers, which was supported by theoretical calculation based on ab-initio molecular orbital theory. The departure of substituted nitrogen atoms from hexagonal layers showed a good correspondence with structure development and changes in transport properties, the presence of nitrogen depressing the developments in structure and transport properties. After the departure of nitrogen above 2300 degrees C graphitization of the films was very remarkable. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:1021 / 1025
页数:5
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