Micromachined pressure sensors: Review and recent developments

被引:38
作者
Eaton, WP
Smith, JH
机构
来源
SMART ELECTRONICS AND MEMS - SMART STRUCTURES AND MATERIALS 1997 | 1997年 / 3046卷
关键词
MEMS; micromachined pressure sensor; review;
D O I
10.1117/12.276606
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Since the discovery of piezoresistivity in silicon in the mid 1950s, silicon based pressure sensors have been widely produced. Micromachining technology has greatly benefited from the success of the integrated circuits industry, borrowing materials, processes, and toolsets. Because of this, microelectromechanical Systems (MEMS) are now poised to capture large segments of existing sensor markets and to catalyze the development of new markets. Given the emerging importance of MEMS, it is instructive to review the history of micromachined pressure sensors, and to examine new developments in the field. Pressure sensors will be the focus of this paper, starting from metal diaphragm sensors with bonded silicon strain gauges, and moving to present developments of surface micromachined, optical, resonant, and smart pressure sensors. Considerations for diaphragm design will be discussed in detail, as well as additional considerations for capacitive and piezor esistive devices.
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页码:30 / 41
页数:12
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