Non-aqueous Electrodeposition of ZnO and CdO films

被引：92

作者：

Jayakrishnan, R ^{[1
]}

Hodes, G ^{[1
]}

机构：

[1] Weizmann Inst Sci, Dept Mat & Interfaces, IL-76100 Rehovot, Israel

来源：

THIN SOLID FILMS | 2003年 / 440卷 / 1-2期

关键词：

ZnO; CdO; Electrodeposition;

D O I：

10.1016/S0040-6090(03)00811-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZnO films were electrodeposited from a dimethylsulfoxide bath containing dissolved gaseous oxygen. Variations in deposition parameters and their effects on the structural (crystal size, growth direction), optical (bandgap variations, photoluminescence) and electrical (conductivity) properties are described. The technique was extended to give highly-conducting films of CdO. (C) 2003 Elsevier B.V All rights reserved.

引用

页码：19 / 25

页数：7

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