Self-assembled nanosilicon/siloxane composite films

被引：18

作者：

Papadimitrakopoulos, F ^{[1
]}

Phely-Bobin, T ^{[1
]}

Wisniecki, P ^{[1
]}

机构：

[1] Univ Connecticut, Inst Mat Sci, Nanomat Optoelect Lab, Dept Chem,Polymer Sci Program, Storrs, CT 06269 USA

来源：

CHEMISTRY OF MATERIALS | 1999年 / 11卷 / 03期

关键词：

D O I：

10.1021/cm9800579

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Transparent Si/SiOx nanocomposite films, spontaneously adsorbed on glass or quartz substrates from their colloidal suspensions via a sonication-assisted oxidation process, are presently reported. Individual nanosilicon particles (ca. 20 nm) appear to cover a significant part of the substrate along with agglomerates on the order of 50-80 nm in thickness. Kinetic studies indicate a rapid initial adsorption that slows down significantly after 3 h.

引用

页码：522 / +

页数：5

共 25 条

[1]

[Anonymous], SILICON BASED POLYM

[2]

[Anonymous], [No title captured]

[3] INFRARED STUDIES OF ROOM-TEMPERATURE DEPOSITION OF HYDROGENATED SILICON-OXIDE FILMS IN RF MAGNETRON DISCHARGES [J].