Short minority carrier response time in HfO2/Ge metal-insulator-semiconductor capacitors

被引:6
作者
Dimoulas, A [1 ]
Vellianitis, G [1 ]
Mavrou, G [1 ]
Evangelou, EK [1 ]
Argyropoulos, K [1 ]
Houssa, A [1 ]
机构
[1] Natl Ctr Sci Res Demokritos, Inst Mat Sci, MBE Lab, GR-15310 Athens, Greece
关键词
high-k dielectrics; germanium; MIS capacitors; molecular beam epitaxy;
D O I
10.1016/j.mee.2005.04.013
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, we elucidate the role of the intrinsic carrier concentration n(i) in the unusual low frequency behavior of the high frequency capacitance voltage curves in inversion which is observed in HfO2/Ge n-type metal-insulator-semiconductor capacitors. We show that the ac inversion conductance is an increasing function of ni showing thermal activation behavior with temperature. This is an indication that, irrespective of the particular mechanism involved, the high n(i) value in Ge, provides a "pool" of carriers which could generate a high density of minority carriers thus inducing the low frequency behavior in inversion. Our analysis shows that the minority carrier response time tau(R) varies inversely proportional to n(i) at room temperature, therefore this time is very short measured in the microsecond range. The short response time results in a fast build-up of inversion charge, so that a low frequency behavior is observed even at high frequencies, in the kHz range.
引用
收藏
页码:34 / 37
页数:4
相关论文
共 6 条
[1]   Experiments in MIS structure based on germanium and improvements of the interfacial properties [J].
Benamara, Z ;
Tizi, S ;
Chellali, M ;
Gruzza, B .
MATERIALS CHEMISTRY AND PHYSICS, 2000, 62 (03) :273-276
[2]   HfO2 high-κ gate dielectrics on Ge(100) by atomic oxygen beam deposition -: art. no. 032908 [J].
Dimoulas, A ;
Mavrou, G ;
Vellianitis, G ;
Evangelou, E ;
Boukos, N ;
Houssa, M ;
Caymax, M .
APPLIED PHYSICS LETTERS, 2005, 86 (03) :1-3
[3]   TEMPERATURE DEPENDENCE OF INVERSION-LAYER FREQUENCY RESPONSE IN SILICON [J].
GOETZBER.A ;
NICOLLIA.EH .
BELL SYSTEM TECHNICAL JOURNAL, 1967, 46 (03) :513-&
[4]   Local epitaxial growth of ZrO2 on Ge(100) substrates by atomic layer epitaxy [J].
Kim, H ;
Chui, CO ;
Saraswat, KC ;
McIntyre, PC .
APPLIED PHYSICS LETTERS, 2003, 83 (13) :2647-2649
[5]  
Nicollian E. H., 1982, MOS METAL OXIDE SEMI, P104
[6]  
WHANG SJ, IEDM 2004, P307