An intense pulsed electrical discharge source for OH molecular beams

被引:43
作者
van Beek, MC [1 ]
ter Meulen, JJ [1 ]
机构
[1] Univ Nijmegen, Dept Mol & Laser Phys, NL-6500 GL Nijmegen, Netherlands
关键词
D O I
10.1016/S0009-2614(01)00223-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this Letter we describe and characterize a pulsed DC discharge source for a molecular beam of OH radicals. The absolute line-integrated OH density has been measured by cavity ring-down spectroscopy, while the off-axis distribution of the radicals has been determined by 1-dimensional laser-induced fluorescence spectroscopy. Combining both measurements the total OH centerline flux at the maximum of the pulse was determined to be (2.2 +/- 0.1) x 10(17) molecules/sr s. No anomalous population distribution was found for the Lambda -doublet components of the rotational ground state. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:237 / 242
页数:6
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