Effect of heat treatment on the UV-vis-NIR and PL spectra of TiO2 films

被引:92
作者
Liu, BS [1 ]
Zhao, XJ [1 ]
Zhao, QN [1 ]
He, X [1 ]
Feng, JY [1 ]
机构
[1] Wuhan Univ Technol, Minist Educ, Key Lab Silicate Mat Sci & Engn, Wuhan 430070, Hubei, Peoples R China
关键词
heat treatment; TiO2; films; crystal-field theory; magnetron sputtering;
D O I
10.1016/j.elspec.2005.05.003
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
TiO2 films fabricated by DC reactive magnetron sputtering on quartz glass substrates were annealed in several different ways. The structure and properties of the films were characterized by UV-vis-NIR, PL spectra and X-ray photoelectron spectroscopy. For the annealed samples, it is interesting that a clear absorption peak was found at 496 nm. The analysis of XPS spectra shows that oxygen can diffuse outward from the lattice, resulting in production of Ti3+ and oxygen vacancies. The PL spectra show that the absorption peak at 496 nm is not induced by a transition within the forbidden band gap. Combining the XPS results with the linear combination of atomic orbital molecular orbital (LCAO-MO) theory and crystal-field (CF) theory, we can explain the appearance of this absorption peak. We conclude that the spectroscopic features result from the t(2g)(*) - e(g)(*) electronic transition in these TiO2 films. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:158 / 163
页数:6
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