Metal-doped carbon films obtained by magnetron sputtering

被引:25
作者
Balden, M [1 ]
Cieciwa, BT
Quintana, I
Pardo, ED
Koch, F
Sikora, M
Dubiel, B
机构
[1] EURATOM, Max Planck Inst Plasmaphys, D-85748 Garching, Germany
[2] AGH Univ Sci & Technol, PL-30059 Krakow, Poland
关键词
structure; crystalline; diffraction; XRD; Spectroscopy; RBS; non-metals; carbon; ceramics; carbides; structures; nanostructure;
D O I
10.1016/j.surfcoat.2005.02.218
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Carbon films doped with Ti, V, W, Zr, Cr, and Cu were produced by magnetron sputtering. To predict the film composition, the deposition rates were systematically studied as a function of discharge power and working pressure. The achieved dopant concentrations range from 20 down to 1 at.%. The films are laterally homogeneously doped and show columnar growth. The dopant distribution is not thermally stable. After heating at 1100 K, the carbides TiC, VC, WC, ZrC, and Cr3C2 are definitely present and their grain size is on the nanometre scale. Cu segregates out. There are strong indications of the formation of carbides already during deposition. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:413 / 417
页数:5
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