Scale-dependent roughening kinetics in vapor deposited gold

被引：35

作者：

Vazquez, L

Salvarezza, RC

Herrasti, P

Ocon, P

Vara, JM

Arvia, AJ

机构：

[1] INST INVEST FIS QUIM TEORICAS & APLICADAS,RA-1900 LA PLATA,ARGENTINA

[2] UNIV AUTONOMA MADRID,DEPT QUIM FIS APLICADA C2,E-28049 MADRID,SPAIN

[3] UNIV AUTONOMA MADRID,DEPT FIS APLICADA,CSIC,INST CIENCIA MAT,E-28049 MADRID,SPAIN

来源：

SURFACE SCIENCE | 1996年 / 345卷 / 1-2期

关键词：

computer simulations; gold; metallic films; scanning tunneling microscopy; surface roughening;

D O I：

10.1016/0039-6028(95)00867-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The roughening kinetics of gold deposits grown from vapor was studied by scanning tunneling microscopy. The dynamic scaling yielded the following growth exponents alpha(I) = 0.90 +/- 0.06 and beta(I) = 0.25 +/- 0.06 for L(s) < d(s), and alpha(II) = 0.37 +/- 0.05 and beta(II) = 0.45 +/- 0.06 for L(s) > d(s), where L(s) is the scan length and d(s) is the average diameter of columns. The scaling properties of the domain-dependent-surface roughness exponents allowed us to give the rationale for experimental data on the fractal behavior of thin metal films.

引用

页码：17 / 26

页数：10

共 32 条

[1] A RHEED STUDY OF EPITAXIAL-GROWTH OF IRON ON A SILICON SURFACE - EXPERIMENTAL-EVIDENCE FOR KINETIC ROUGHENING [J].