Water diffusion and surface structural relaxation of silica glasses

被引:65
作者
Tomozawa, M [1 ]
Kim, DL [1 ]
Agarwal, A [1 ]
Davis, KM [1 ]
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, Troy, NY 12180 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/S0022-3093(01)00648-2
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Surface structural relaxation of silica glass takes place more rapidly than bulk structural relaxation when the glasses are heat-treated in the presence of water vapor at temperatures below the glass transition temperature. It appears that water enters into silica glass and accelerates the structural change. When silica glass with high hydroxyl content is heated in a relative dry atmosphere, the hydroxyl concentration in the surface decreases. Yet, surface structural relaxation still occurs more rapidly than bulk structural relaxation during such dehydration experiments. For commercially available silica glasses, water exists in the glass predominantly as hydroxyl, but a small fraction can exist as molecular water. The observed surface structural relaxation phenomena are consistent with the postulation that surface structural relaxation is promoted by the presence of this immeasurably small quantity of molecular water rather than the hydroxyl water. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:73 / 80
页数:8
相关论文
共 23 条
[1]   A SIMPLE IR SPECTROSCOPIC METHOD FOR DETERMINING FICTIVE TEMPERATURE OF SILICA GLASSES [J].
AGARWAL, A ;
DAVIS, KM ;
TOMOZAWA, M .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 185 (1-2) :191-198
[2]   Surface and bulk structural relaxation kinetics of silica glass [J].
Agarwal, A ;
Tomozawa, M .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1997, 209 (03) :264-272
[3]  
AGARWAL A, 1995, THESIS RPI
[4]   An infrared spectroscopic study of water-related species in silica glasses [J].
Davis, KM ;
Tomozawa, M .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 201 (03) :177-198
[5]   Quantitative infrared spectroscopic measurement of hydroxyl concentrations in silica glass [J].
Davis, KM ;
Agarwal, A ;
Tomozawa, M ;
Hirao, K .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 203 :27-36
[6]   WATER DIFFUSION INTO SILICA GLASS - STRUCTURAL-CHANGES IN SILICA GLASS AND THEIR EFFECT ON WATER SOLUBILITY AND DIFFUSIVITY [J].
DAVIS, KM ;
TOMOZAWA, M .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1995, 185 (03) :203-220
[7]  
DAVIS KM, 1994, THESIS RPI
[8]   ION IMPLANTATION-INDUCED AND RADIATION-INDUCED STRUCTURAL MODIFICATIONS IN AMORPHOUS SIO2 [J].
DEVINE, RAB .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1993, 152 (01) :50-58
[9]  
DINGWELL DB, 1990, EUR J MINERAL, V2, P27
[10]   Diffusion of oxygen in silica glass [J].
Doremus, RH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1996, 143 (06) :1992-1995