Fabrication of conductive wires by electron-beam-induced deposition

被引:21
作者
Hiroshima, H [1 ]
Komuro, M [1 ]
机构
[1] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
关键词
D O I
10.1088/0957-4484/9/2/012
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Conductive wires are fabricated by electron-beam-induced deposition. In fabrication, the deposition property of the beam-induced process has been demonstrated using rate equations describing precursor molecule supply and consumption by electron irradiation. Repeated electron beam line scanning is thought to be more effective in wire fabrication than single slow scanning. Conditions arise, however, where the result is other than anticipated. Results are explained by the secondary electrons emitted by the primary electron beam considering the angle dependence of the secondary electron yield.
引用
收藏
页码:108 / 112
页数:5
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