Ion chemistry in octafluorocyclobutane, c-C4F8

被引:48
作者
Jiao, CQ
Garscadden, A
Haaland, PD
机构
[1] AFRLPR, Wright Patterson AFB, OH 45433 USA
[2] Mobium Enterprises, Dayton, OH 45431 USA
关键词
D O I
10.1016/S0009-2614(98)01107-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Cross-sections for electron impact ionization of octafluorocyclobutane (c-C4F8) have been measured from 10 to 200 eV by Fourier transform mass spectrometry. No parent ion is observed and over half of the dissociative ionization yields C2F4+ and C3F5+. Eleven other fluorocarbon cations are produced with smaller cross-sections, giving a total ionization cross-section of (1.6 +/- 0.2) x 10(-15) cm(2) between 80 and 200 eV. Only CF,I and C2F(3)(+) react further with the parent molecule to yield C3F5+ as the primary product. No evidence of cationic polymerization was found. F- and C4F8- are formed by electron attachment at energies below 10 eV, but neither reacts further with c-C4F8. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:121 / 126
页数:6
相关论文
共 28 条
[1]   ELECTRON DISAPPEARANCE IN PULSE IRRADIATED FLUOROCARBON GASES [J].
BANSAL, KM ;
FESSENDE.RW .
JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (04) :1760-1768
[2]   MOLECULAR ELECTRON IONIZATION CROSS SECTIONS AT 70-EV [J].
BERAN, JA ;
KEVAN, L .
JOURNAL OF PHYSICAL CHEMISTRY, 1969, 73 (11) :3866-&
[3]   IONIZATION AND DISSOCIATION IN SOME FLUOROCARBON GASES [J].
BIBBY, MM ;
CARTER, G .
TRANSACTIONS OF THE FARADAY SOCIETY, 1963, 59 (491) :2455-&
[4]   ELECTRON-ATTACHMENT TO PERFLUOROCARBON COMPOUNDS .1. C4F6,2-C4F6,1,3-C4F6,C-C4F8 AND 2-C4F8 [J].
CHRISTODOULIDES, AA ;
CHRISTOPHOROU, LG ;
PAI, RY ;
TUNG, CM .
JOURNAL OF CHEMICAL PHYSICS, 1979, 70 (03) :1156-1168
[5]   EFFECT OF TEMPERATURE ON THE LOW-ENERGY (LESS-THAN-OR-APPROXIMATELY-1EV) ELECTRON-ATTACHMENT TO PERFLUOROCYCLOBUTANE (C-C4F8) [J].
CHRISTODOULIDES, AA ;
CHRISTOPHOROU, LG ;
MCCORKLE, DL .
CHEMICAL PHYSICS LETTERS, 1987, 139 (3-4) :350-356
[6]   ELECTRON ATTACHMENT TO CCL2F2 AND C-C4F8 BELOW CONGRUENT 2 EV [J].
CHRISTOPHOROU, LG ;
MCCORKLE, DL ;
PITTMAN, D .
JOURNAL OF CHEMICAL PHYSICS, 1974, 60 (03) :1183-1184
[7]  
CHRISTOPHOROU LG, 1981, J PHYS D APPL PHYS, V14, P1889, DOI 10.1088/0022-3727/14/10/021
[8]   THERMAL ENERGY ELECTRON ATTACHMENT RATE CONSTANTS FOR SOME POLYATOMIC-MOLECULES [J].
DAVIS, FJ ;
COMPTON, RN ;
NELSON, DR .
JOURNAL OF CHEMICAL PHYSICS, 1973, 59 (05) :2324-2329
[9]   ANALYSIS OF POLYMER FORMATION DURING SIO2 MICROWAVE PLASMA-ETCHING [J].
GOTOH, Y ;
KURE, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (4B) :2132-2136
[10]  
GRAJOWER R, 1968, ISRAEL J CHEM, V6, P847