New diffractive beam shaper generated with the aid of e-beam lithography

被引：9

作者：

Golub, MA

Duparre, M

Kley, EB

Kowarschik, R

Ludge, B

Rockstroh, W

Fuchs, HJ

机构：

[1] UNIV JENA,INST APPL OPT,D-07743 JENA,GERMANY

[2] UNIV JENA,INST APPL PHYS,D-07743 JENA,GERMANY

来源：

OPTICAL ENGINEERING | 1996年 / 35卷 / 05期

关键词：

diffractive optics; binary optics; computer-generated holograms; electron-beam lithograph; beam shapers; measurements of intensity patterns;

D O I：

10.1117/1.600697

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A diffractive optical element has been fabricated which converts a Gaussian CO2-laser beam into a flat-top rectangle. This was accomplished by enhanced photolithographic technology with e-beam generated masks. Experimental patterns of the shaped intensity for a single-mode CO2 laser are presented. (C) 1996 Society of Photo-Optical instrumentation Engineers.

引用

页码：1400 / 1406

页数：7

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