Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

被引：22

作者：

Naulleau, P ^{[1
]}

Goldberg, K ^{[1
]}

Lee, S ^{[1
]}

Chang, C ^{[1
]}

Bresloff, C ^{[1
]}

Batson, P ^{[1
]}

Attwood, D ^{[1
]}

Bokor, J ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES II | 1998年 / 3331卷

关键词：

interferometry; point diffraction interferometry; extreme ultraviolet lithography; phase-shifting interferometry; accuracy;

D O I：

10.1117/12.309563

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The phase-shifting point diffraction interferometer (PS/PDI) has recently been developed and implemented at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing extreme ultraviolet (EUV) projection lithography systems. Here progress on the characterization of the PS/PDI accuracy is presented. Two major classes of errors affect the accuracy of the interferometer: the first being systematic effects arising from the measurement geometry, and the second being random and systematic errors caused by an imperfect reference wave. In order to characterize these contributions and calibrate the interferometer, a null test is required. This null test also serves as a measure of the absolute accuracy of the interferometer. Experimental results demonstrating a systematic-error-limited accuracy of 0.004 waves (lambda/250 or 0.05 nm at lambda = 13.4 nm) is reported.

引用

页码：114 / 123

页数：10