Substrate suppression of thermal roughness in stacked supported bilayers

被引：6

作者：

DeCaro, Curt M. ^{[1
]}

Berry, Justin D. ^{[1
]}

Lurio, Laurence B. ^{[1
]}

Ma, Yicong ^{[2
]}

Chen, Gang ^{[2
]}

Sinha, Sunil ^{[2
]}

Tayebi, Lobat ^{[3
]}

Parikh, Atul N. ^{[3
]}

Jiang, Zhang ^{[4
]}

Sandy, Alec R. ^{[4
]}

机构：

[1] No Illinois Univ, Dept Phys, De Kalb, IL 60115 USA

[2] Univ Calif San Diego, Dept Phys, La Jolla, CA 92093 USA

[3] Univ Calif Davis, Dept Appl Phys, Davis, CA 95616 USA

[4] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA

来源：

PHYSICAL REVIEW E | 2011年 / 84卷 / 04期

关键词：

LIPID-BILAYERS; PHASE-BEHAVIOR;

D O I：

10.1103/PhysRevE.84.041914

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

We have fabricated a stack of five 1,2-dipalmitoyl-sn-3-phosphatidylethanolamine (DPPE) bilayers supported on a polished silicon substrate in excess water. The density profile of these stacks normal to the substrate was obtained through analysis of x-ray reflectivity. Near the substrate, we find the layer roughness and repeat spacing are both significantly smaller than values found in bulk multilayer systems. The reduced spacing and roughness result from suppression of lateral fluctuations due to the flat substrate boundary. The layer spacing decrease then occurs due to reduced Helfrich repulsion.

引用

页数：5

共 20 条

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