Strain relaxation by directionally aligned precipitate nanoparticles in the growth of single-crystalline Gd-doped ceria thin films

被引:14
作者
Huang, DX
Chen, CL
Chen, L
Jacobson, AJ
机构
[1] Univ Houston, Dept Chem, Houston, TX 77204 USA
[2] Univ Houston, Ctr Mat Chem, Houston, TX 77204 USA
[3] Univ Houston, Dept Phys, Houston, TX 77204 USA
[4] Univ Houston, Texas Ctr Superconduct & Adv Mat, Houston, TX 77204 USA
关键词
D O I
10.1063/1.1644035
中图分类号
O59 [应用物理学];
学科分类号
摘要
Transmission electron microscopy has been used to investigate the microstructure and epitaxial behavior of gadolinium-doped ceria (Ce0.8Gd0.2O2-delta) thin films on single crystal (001) LaAlO3. The results show that the films have single-crystal cubic structure and a sharp interface with an interface relationship of (001)(film)parallel to(001)(sub) and [100](film)parallel to[110](sub). Accompanying the high film crystallinity, a directionally aligned, precipitated nanoparticle structure has been observed. The precipitated particles have an average size of similar to4 nm, a Ga-rich composition of Ce0.7Gd0.3O2-delta, a rhombic shape with mainly {111} facets, and are uniformly distributed over the entire film area. The nanoparticles contribute a uniform tensile strain to the film that effectively compensates the compressive film strain induced by the substrate, and also leads to a uniform relaxation of the residual film strain by generating misfit dislocations at the film/particle interfaces. The high film crystallinity is believed to result from this uniform film strain relaxation mechanism. (C) 2004 American Institute of Physics.
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页码:708 / 710
页数:3
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