Gas-phase study of the reactivity of optical coating materials with hydrocarbons by use of a desktop-size extreme-ultraviolet laser

被引：20

作者：

Heinbuch, Scott ^{[1
,2
]}

Dong, Feng ^{[2
,3
]}

Rocca, Jorge J. ^{[1
,2
]}

Bernstein, Elliot R. ^{[2
,3
]}

机构：

[1] Colorado State Univ, Dept Elect & Comp Engn, Ft Collins, CO 80523 USA

[2] Colorado State Univ, Engn Res Ctr Extreme Ultraviolet Sci & Technol, Natl Sci Fdn, Ft Collins, CO 80523 USA

[3] Colorado State Univ, Dept Chem, Ft Collins, CO 80523 USA

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 2008年 / 25卷 / 07期

关键词：

D O I：

10.1364/JOSAB.25.000B85

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The reactivity of prospective capping-layer extreme-ultraviolet (EUV) mirror materials with hydrocarbons is studied in the gas phase by use of mass spectroscopy of metal-oxide clusters. We report the results of chemistry studies for Si-m, Ti-m, Hf-m, and ZrmOn metal-oxide clusters in which the reaction products were ionized with little or no fragmentation by 26.5 eV photons from a desktop-size 46.9 nm Ne-like Ar laser. Hf and Zr oxides are found to be much less reactive than Si or Ti oxides in the presence of EUV light. The results are relevant to the design of EUV mirror capping layers that are resistant to carbon contamination. (C) 2008 Optical Society of America.

引用

页码：B85 / B91

页数：7

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