The re-oxidation of the substoichiometric TiO2(110) surface in the presence of crystallographic shear planes

被引:17
作者
Bennett, RA [1 ]
机构
[1] Univ Reading, Dept Chem, Sufface Sci & Catalysis Res Ctr, Reading RG6 6AD, Berks, England
来源
PHYSCHEMCOMM | 2000年 / 1-14期
关键词
D O I
10.1039/b001938k
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Re-oxidation of reduced oxide surfaces is a fundamental step in catalysis and related fields. This paper reports the first study of the re-oxidation, at elevated temperature, of crystallographic shear planes (CSPs) occurring on the non-stoichiometric rutile TiO2(110) surface by scanning tunnelling microscopy (STM). The re-oxidation occurs by the reaction of interstitial Tin+ ions dissolved in the crystal bulk with oxygen at the surface to re-grow new TiO2 layers on the surface. The CSPs act as nucleation centres for the re-growth and are, in general, preserved during the early stages of the re-oxidation. CSPs appear in pairs on the surface and sandwich a layer of rutile that is displaced by one half an atomic step height from the original terrace. Each step edge of the pair shows markedly different structure and growth rate. The growth of the surface also takes place on the displaced region between CSP pairs.
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页数:6
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