Observation of adsorption and reaction of NH3 on crystalline Al2O3 under steady-state conditions using external-reflection infrared spectroscopy

被引:12
作者
Bermudez, VM [1 ]
机构
[1] USN, Res Lab, Washington, DC 20375 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1998年 / 16卷 / 04期
关键词
D O I
10.1116/1.581384
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thin crystalline films of Al2O3 have been grown by reaction of a NiAl(111) surface with chemisorbed O at elevated temperature. The resulting Al2O3/NiAl buried metal layer structure has then been used as a substrate for studies of NH3 adsorption under steady-state conditions at similar to 300 K and up to similar to 200 Torr. The technique used is polarization-modulated infrared reflection absorption spectroscopy, the application of which to in situ studies of surface chemistry is described in detail: Evidence is seen that suggests incorporation of N into the Al2O3, and adsorbed NH3 is detected under high (greater than or equal to 25 Torr) static pressures. [S0734-2101(98)07604-0].
引用
收藏
页码:2572 / 2580
页数:9
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