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Andricacos P.C., Uzoh C., Dukovic J.O., Horkans J., Deligianni H., Damascene copper electroplating for chip interconnections, IBM Journal of Research and Development, 42, pp. 567-574, (1998)
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Baker B.C., Freeman M., Melnick B., Wheeler D., Josell D., Moffat T.P., Superconformal electrodeposition of silver from a KAg(CN)-KCN-KSeCN electrolyte, Journal of the Electrochemical Society, 150, 2, (2003)
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Baker B.C., Witt C., Wheeler D., Josell D., Moffat T.P., Superconformal silver deposition using KSeCN derivatized substrates, Electrochemical and Solid-State Letters, 6, 5, (2003)
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Josell D., Baker B., Witt C., Wheeler D., Moffat T.P., Via filling by electrodeposition: Superconformal silver and copper and conformal nickel, Journal of the Electrochemical Society, 149, (2002)
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Josell D., Beauchamp C.R., Kelley D.R., Witt C.A., Moffat T.P., Gold superfill in sub-micrometer trenches, Electrochemical and Solid-State Letters, 8, 3, (2005)
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Josell D., Bonevich J.E., Moffat T.P., Aaltonen T., Ritala M., Leskela M., Iridium barriers for direct copper electrodeposition in damascene processing, Electrochemical and Solid-State Letters, 9, 2, (2006)
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Josell D., Wheeler D., Huber W.H., Bonevich J.E., Moffat T.P., A simple equation for predicting superconformal electrodeposition in submicrometer trenches, Journal of the Electrochemical Society, 148, (2001)
[9]
Josell D., Wheeler D., Huber W.H., Moffat T.P., Superconformal electrodeposition in submicron features, Physical Review Letters, 87, 1, (2001)
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Josell D., Wheeler D., Moffat T.P., Superconformal electrodeposition in vias, Electrochemical and Solid-State Letters, 5, (2002)