Three-dimensional mask transmission simulation using a single integral equation method

被引：8

作者：

Yeung, MS ^{[1
]}

Barouch, E ^{[1
]}

机构：

[1] Boston Univ, Dept Mfg Engn, Boston, MA 02215 USA

来源：

OPTICAL MICROLITHOGRAPHY XI | 1998年 / 3334卷

关键词：

photolithography simulation; single integral equation; dyadic Green's functions;

D O I：

10.1117/12.310803

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A single integral equation formulation for electromagnetic scattering from three-dimensional dielectric objects is discussed. The new formulation converges significantly faster than the traditional, coupled integral equation formulation. The new formulation is extended to incorporate the exact boundary conditions for isolated mask features by using dyadic Green's functions for the stratified medium background. Results of three-dimensional phase-shifting mask simulation are presented.

引用

页码：704 / 713

页数：2