Assessment of optical coatings for 193-nm lithography

被引：4

作者：

Liberman, V ^{[1
]}

Rothschild, M ^{[1
]}

Sedlacek, JHC ^{[1
]}

Uttaro, RS ^{[1
]}

Grenville, A ^{[1
]}

Bates, AK ^{[1
]}

Van Peski, C ^{[1
]}

机构：

[1] MIT, Lincoln Lab, Lexington, MA 02173 USA

来源：

OPTICAL MICROLITHOGRAPHY XI | 1998年 / 3334卷

关键词：

antireflective coatings; 193-nm lithography; absorption; laser-induced damage;

D O I：

10.1117/12.310775

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We present an assessment of antireflective coatings for 193-nm lithography; Coatings from nine suppliers were exposed in a nitrogen ambient for up to 1.5 billion pulses at 15 mJ/cm(2)/pulse at 400 Hz. Sensitive metrology, developed for this study, included reflectance/transmittance measurements, in-situ ratiometric transmission measurements, and interferometric calorimetry for absorption measurements. The coatings from at least two suppliers withstood >1 billion pulses with no observable degradation. Catastrophic damage observed on some samples included blistering and a dramatic transmission drop. Such damage occurred rather early (<100 million pulses).

引用

页码：470 / 479

页数：2