X-ray magnetic circular dichroism in Fe/NiO thin films

被引：13

作者：

Alvarenga, AD

Garcia, F

Sampaio, LC

Giles, C

Yokaichiya, F

Achete, CA

Simao, RA

Guimaraes, AP

机构：

[1] Ctr Brasileiro Pesquisas Fis, CNPq, BR-22290 Rio De Janeiro, RJ, Brazil

[2] Univ Estadual Campinas, UNICAMP, Inst Fis Gleb Wataghin, BR-13083970 Campinas, SP, Brazil

[3] Univ Fed Rio de Janeiro, COPPE, Programa Engn Met & Mat, BR-21945 Rio De Janeiro, RJ, Brazil

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2001年 / 233卷 / 1-2期

关键词：

thin films; ferromagnetism; antiferromagnetism; X-ray magnetic circular dichroism; X-ray absorption; synchrotron radiation; magnetic moments;

D O I：

10.1016/S0304-8853(01)00231-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The interface of thin films of Fe/NiO (1 0 0)-oriented single crystals was studied by X-ray magnetic circular dichroism (XMCD). Thin layers of Fe were removed by "in situ" sputtering, followed by XMCD measurements, resulting in a depth profile. A decrease from the bulk value in the value of the Fe moment Lit the interface of Fe with the antiferromagnetic NiO(100) was observed. (C) 2001 Elsevier Science B.V. All rights reserved.

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页码：74 / 77

页数：4

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