Antireflecting-passivating dielectric films on crystalline silicon solar cells for space applications

被引：27

作者：

Barrera, M. ^{[1
]}

Pla, J. ^{[1
]}

Bocchi, C. ^{[2
]}

Migliori, A. ^{[3
]}

机构：

[1] CNEA, Ctr Atom Constituyentes, Dept Fis, San Martin, Buenos Aires, Argentina

[2] CNR, IMEM Inst, I-43100 Parma, Italy

[3] CNR, Sez Bologna, IMM Inst, I-40129 Bologna, Italy

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2008年 / 92卷 / 09期

关键词：

antireflecting films; TiO2; silicon solar cells; space applications;

D O I：

10.1016/j.solmat.2008.03.021

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

Anti reflecting-passivating TiO2-SiO2 double layers on crystalline silicon (Si) were optimized and characterized for space solar cells applications. In the numeric optimization, the MgF2-glass- adiesive-TiO2-SiO2-Si structure was considered. In order to fabricate the TiO2-SiO2 double layer, titanium films were deposited on Si wafers in a Vacuum chamber, and then, the sample was annealed in oxygen at high temperatures. Glasses with evaporated MgF2 thin films were bonded to the TiO2-SiO2-Si samples so as to obtain the complete structure. A gain Of Up to 23.5% in the maximum power is demonstrated for simulated c-Si solar Cells using the optimized structure. Characterization of the TiO2-SiO2-Si structure using transmission electron microscopy (TEM) and X-ray reflectivity (XRR) as well as optical characterization are presented. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1115 / 1122

页数：8

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